Plasma Ion Source with an Internal Evaporator

Ion kinetics in a magnetized plasma source

There are regimes of plasma source operation in which the ion motion is controlled by the ambipolar electric eld and ion-atom collisions. This paper presents a derivation of the corresponding ion distribution function and plasma density pro les in the source for a given electron temperature and a given gas ionization rate. Conditions are discussed under which the ion ux is predominantly radial ...

Thyratron Modulators in Plasma Source Ion Implantation

Plasma Source Ion Implantation (PSII) is an emerging technology which can be used to harden metal surfaces in a conformal manner. North Star Research Corp. (NSRC) is building a unique implanter system for Empire Hard Chrome which will be the first truly commercial implanter of this type. The choice of pulsed power technology for this application is important from the standpoint of both reliabil...

Kinetic Plasma Simulation of Ion Beam Extraction from an Ecr Ion Source

Designing optimized ECR ion beam sources can be streamlined by the accurate simulation of beam optical properties in order to predict ion extraction behavior. The complexity of these models, however, can make PICbased simulations time-consuming. In this paper, we first describe a simple kinetic plasma finite element simulation of extraction of a proton beam from a permanent magnet hexapole elec...

An Automatic Real Time Impedance Matching System for Use in an RF Electrostatics Accelerator Ion Source

Rf Plasma-based Ion Source Modeling on Unstructured Meshes

Ion source performance for accelerators and industrial applications can be improved through detailed numerical modeling and simulation. There are a number of technical complexities with developing robust models, including a natural separation of important time scales (rf, electron and ion motion), inclusion of plasma chemistry, and surface effects such as secondary electron emission and sputter...